The Monte Carlo Simulation of Secondary Electrons Excitation in the Resist PMMA

Xiao Pei

Abstract


The Monte Carlo method was used to simulate the process of secondary electrons excitation in resist PMMA with Mott cross section and dielectric function model. By analyzing the characteristics of secondary electrons excitation in the resist PMMA, and the simulation of secondary electrons energy range, we hold the opinion that the secondary electrons can not be ignored in the electron beam lithography.


Full Text: PDF DOI: 10.5539/apr.v6n3p1

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This work is licensed under a Creative Commons Attribution 3.0 License.

Applied Physics Research   ISSN 1916-9639 (Print)   ISSN 1916-9647 (Online)

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